JPS6367352B2 - - Google Patents

Info

Publication number
JPS6367352B2
JPS6367352B2 JP18493584A JP18493584A JPS6367352B2 JP S6367352 B2 JPS6367352 B2 JP S6367352B2 JP 18493584 A JP18493584 A JP 18493584A JP 18493584 A JP18493584 A JP 18493584A JP S6367352 B2 JPS6367352 B2 JP S6367352B2
Authority
JP
Japan
Prior art keywords
semiconductor substrate
temperature
layer
heater
degassing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18493584A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6163078A (ja
Inventor
Haruo Tanaka
Masahito Mushigami
Juji Ishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP18493584A priority Critical patent/JPS6163078A/ja
Publication of JPS6163078A publication Critical patent/JPS6163078A/ja
Publication of JPS6367352B2 publication Critical patent/JPS6367352B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Semiconductor Lasers (AREA)
JP18493584A 1984-09-03 1984-09-03 半導体レ−ザの製造方法 Granted JPS6163078A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18493584A JPS6163078A (ja) 1984-09-03 1984-09-03 半導体レ−ザの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18493584A JPS6163078A (ja) 1984-09-03 1984-09-03 半導体レ−ザの製造方法

Publications (2)

Publication Number Publication Date
JPS6163078A JPS6163078A (ja) 1986-04-01
JPS6367352B2 true JPS6367352B2 (en]) 1988-12-26

Family

ID=16161920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18493584A Granted JPS6163078A (ja) 1984-09-03 1984-09-03 半導体レ−ザの製造方法

Country Status (1)

Country Link
JP (1) JPS6163078A (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0275237U (en]) * 1988-11-30 1990-06-08

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0275237U (en]) * 1988-11-30 1990-06-08

Also Published As

Publication number Publication date
JPS6163078A (ja) 1986-04-01

Similar Documents

Publication Publication Date Title
JPS6392012A (ja) 積層物品およびその製造方法
JPH01187814A (ja) 薄膜半導体装置の製造方法
US4073675A (en) Waveguiding epitaxial LiNbO3 films
JPS6367352B2 (en])
JPS5918196A (ja) 単結晶薄膜の製造方法
JPH027415A (ja) Soi薄膜形成方法
JPS623089A (ja) 半導体製造装置
JPH03293719A (ja) 結晶性半導体薄膜の製造方法
JP3154430B2 (ja) Al Ga As 薄膜成長方法
JPH0137870B2 (en])
JPS6142985A (ja) 半導体レ−ザおよびその製造方法
JPS5940525A (ja) 成膜方法
JP3163773B2 (ja) 薄膜製造方法
JPS6129190A (ja) 半導体レ−ザの製造方法
JPH0361335B2 (en])
JP2603121B2 (ja) 化合物半導体薄膜の形成方法
JPS6092607A (ja) 電子ビ−ムアニ−ル装置
JPS60253211A (ja) 分子線エピタキシ−装置
JPH0656911B2 (ja) 半導体レーザの製造方法
JPH04245490A (ja) 半導体レーザの製造方法
JPH04245417A (ja) 化合物半導体層の形成方法
JPS6246520B2 (en])
JPS6022316A (ja) 化合物半導体装置の製造方法
JPH0327584A (ja) 半導体レーザの製造方法
JPH02194685A (ja) 半導体レーザの製造方法